Load-lock compatible

Cooled substrate platen

RF-biasable

In-situ Z-shift

Modular construction

Used with ICP source for effective etching of diamond.

We feature staging apparatus for a variety of applications for both research and industrial environments.  Stand-alone or a combination of heating, cooling, rotation, biasing, and various movements of samples are just some of the features that we have built into our stages. The life of a otherwise obsolete system can be extended by adding a versatile staging apparatus.

At times, our customers are the main inspiration for the designs that our engineers have developed.  After all, most of them have told us exactly the functionality  they would like their stage to have.  A short time later, they are literally using the stage that they had envisioned.

 Contact us to find out how we may be able to help you in building a substrate or target stage that will meet your requirements.

Download Stage specification sheet (pdf).